发明名称 |
Apparatus and system for cleaning a substrate |
摘要 |
An apparatus for cleaning a substrate is disclosed. The apparatus having a first head unit and a second head unit. The first head unit is positioned proximate to the surface of the substrate and has a first row of channels defined within configured to supply a foam to the surface of the substrate. The second head unit is positioned substantially adjacent to the first head unit and proximate to the surface of the substrate. A second and a third row of channels are defined within the second head unit. The second row of channels is configured to supply a fluid to the surface of the substrate. The third row of channels is configured to apply a vacuum to the surface of the substrate.
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申请公布号 |
US8522799(B2) |
申请公布日期 |
2013.09.03 |
申请号 |
US20060532493 |
申请日期 |
2006.09.15 |
申请人 |
FREER ERIK M.;DE LARIOS JOHN M.;MIKHAYLICHENKO KATRINA;RAVKIN MICHAEL;KOROLIK MIKHAIL;REDEKER FRED C.;THOMAS CLINT;PARKS JOHN;LAM RESEARCH CORPORATION |
发明人 |
FREER ERIK M.;DE LARIOS JOHN M.;MIKHAYLICHENKO KATRINA;RAVKIN MICHAEL;KOROLIK MIKHAIL;REDEKER FRED C.;THOMAS CLINT;PARKS JOHN |
分类号 |
B08B3/00 |
主分类号 |
B08B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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