发明名称 SEMICONDUCTOR DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a transistor having favorable electric characteristics and high reliability, and provide a display device using the transistor. <P>SOLUTION: A bottom-gate transistor using an oxide semiconductor for a channel region, comprises an active layer composed of an oxide semiconductor layer dehydrated or dehydrogenated by heat treatment. The active layer includes a first region on a fine crystallized superficial layer part and a second region other than the first region. By using the oxide semiconductor layer having such a structure, a change to an n-type due to re-entry of moisture from the superficial layer part or elimination of oxygen, and generation of a parasitic channel, are suppressed. And contact resistance between the oxide semiconductor layer and source and drain electrodes can be reduced. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013110425(A) 申请公布日期 2013.06.06
申请号 JP20120282461 申请日期 2012.12.26
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 YAMAZAKI SHUNPEI;SAKAKURA MASAYUKI;WATANABE RYOSUKE;SAKATA JUNICHIRO;AKIMOTO KENGO;MIYANAGA SHOJI;HIROHASHI TAKUYA;KISHIDA HIDEYUKI
分类号 H01L21/336;G09F9/30;H01L29/786;H01L51/50;H05B33/14 主分类号 H01L21/336
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