| 摘要 |
PURPOSE: A chemical supplying pump of a substrate coater device is provided to minimize the generation of bubbles in a chemical supplied to a substrate to be treated. CONSTITUTION: A chemical supplying pump(100) of a substrate includes a cylinder(110), a plunger(120), and a sealing member(130). The cylinder includes an inlet(112), a chemical inducing groove(116), and an outlet(114). The plunger moves along the axial line of the cylinder. The sealing member is in the shape of a membrane and seals a gap between the cylinder and the plunger. The plunger moves to implement a suction operation and a discharging operation to discharge sucked fluid through the outlet. |
