METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

摘要

PURPOSE: A manufacturing method of a polymer compound is provided to be useful as a base component for a resist composition with reduced defect generation and excellent lithography performance. CONSTITUTION: A manufacturing method of a polymer compound comprises a step of copolymerizing a monomer including -SO2- containing a cyclic group and a monomer containing an acid decomposable group of which polarity can be increased by an acid. The polymer compound does not contain a structure unit derived from a monomer which forms acid by exposure. The copolymerization is conducted under the presence of 0.001-1.0 mol% of a basic compound.