发明名称 |
METHOD FOR MANUFACTURING WORKING STAGE WITH CNT ANTISTATIC TREATMENT AND THE WORKING STAGE WITH CNT ANTISTATIC TREATMENT |
摘要 |
PURPOSE: A method for antistatic treatment on a work stage and a work stage undergoing antistatic treatment are provided to control surface resistances and lower the frictional coefficient of a work stage. CONSTITUTION: A method for antistatic treatment on a work stage comprises the steps of: anodizing the surface of a metal work stage to form a plurality of oxidizing surface holes(S10), inserting carbon nano tubes in the oxidizing surface holes at least partially(S20), hardening the carbon nano tubes(S30), and sealing the holes of the work stage(S40).
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申请公布号 |
KR20120042123(A) |
申请公布日期 |
2012.05.03 |
申请号 |
KR20100103637 |
申请日期 |
2010.10.22 |
申请人 |
TOP NANOSYS, INC. |
发明人 |
PARK, DO HYEONG;LEE, DONG MYEON;AHN, YO CHAN;KOO, SUNG CHANG |
分类号 |
C25D11/04;C23C16/44;H01L21/683 |
主分类号 |
C25D11/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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