发明名称 METHOD FOR MANUFACTURING WORKING STAGE WITH CNT ANTISTATIC TREATMENT AND THE WORKING STAGE WITH CNT ANTISTATIC TREATMENT
摘要 PURPOSE: A method for antistatic treatment on a work stage and a work stage undergoing antistatic treatment are provided to control surface resistances and lower the frictional coefficient of a work stage. CONSTITUTION: A method for antistatic treatment on a work stage comprises the steps of: anodizing the surface of a metal work stage to form a plurality of oxidizing surface holes(S10), inserting carbon nano tubes in the oxidizing surface holes at least partially(S20), hardening the carbon nano tubes(S30), and sealing the holes of the work stage(S40).
申请公布号 KR20120042123(A) 申请公布日期 2012.05.03
申请号 KR20100103637 申请日期 2010.10.22
申请人 TOP NANOSYS, INC. 发明人 PARK, DO HYEONG;LEE, DONG MYEON;AHN, YO CHAN;KOO, SUNG CHANG
分类号 C25D11/04;C23C16/44;H01L21/683 主分类号 C25D11/04
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