| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a monomer for a resin of a resist composition which can form a pattern having outstanding resolution. <P>SOLUTION: A compound is expressed by formula (I) (wherein R<SP POS="POST">1</SP>denotes a hydrogen atom or a methyl group; A<SP POS="POST">1</SP>denotes a divalent linking group; R<SP POS="POST">2</SP>, R<SP POS="POST">3</SP>, R<SP POS="POST">4</SP>, R<SP POS="POST">5</SP>, and R<SP POS="POST">6</SP>each independently denote a hydrogen atom or a hydroxy group, or the two groups thereof which adjoin each other in the bonding position on the benzene ring join together to form a non-aromatic ring, wherein at least one group chosen from the group consisting of R<SP POS="POST">2</SP>, R<SP POS="POST">3</SP>, R<SP POS="POST">4</SP>, R<SP POS="POST">5</SP>, and R<SP POS="POST">6</SP>denotes a hydroxy group, and at least other two groups form a non-aromatic ring with the carbon atoms on the benzene ring with which they combine and which adjoins each other). <P>COPYRIGHT: (C)2012,JPO&INPIT |
