发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAID DEVICE
摘要 <p>It is an objective of the present invention to increase channel current density while allowing a GaN field effect transistor to perform normally-off operation. Provided is a a semiconductor device comprising a group 3-5 compound semiconductor channel layer including nitrogen; an electron supply layer that has a groove in a surface thereof that is opposite a surface facing the channel layer and that supplies the channel layer with electrons; a p-type semiconductor layer that is formed in the groove of the electron supply layer; and a control electrode formed directly on the p-type semiconductor layer or on an intermediate layer formed on the p-type semiconductor layer.</p>
申请公布号 KR20110005775(A) 申请公布日期 2011.01.19
申请号 KR20107016844 申请日期 2009.03.18
申请人 SUMITOMO CHEMICAL CO., LTD. 发明人 SAZAWA HIROYUKI;NISHIKAWA NAOHIRO;KURITA YASUYUKI;HATA MASAHIKO
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
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