发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAID DEVICE |
摘要 |
<p>It is an objective of the present invention to increase channel current density while allowing a GaN field effect transistor to perform normally-off operation. Provided is a a semiconductor device comprising a group 3-5 compound semiconductor channel layer including nitrogen; an electron supply layer that has a groove in a surface thereof that is opposite a surface facing the channel layer and that supplies the channel layer with electrons; a p-type semiconductor layer that is formed in the groove of the electron supply layer; and a control electrode formed directly on the p-type semiconductor layer or on an intermediate layer formed on the p-type semiconductor layer.</p> |
申请公布号 |
KR20110005775(A) |
申请公布日期 |
2011.01.19 |
申请号 |
KR20107016844 |
申请日期 |
2009.03.18 |
申请人 |
SUMITOMO CHEMICAL CO., LTD. |
发明人 |
SAZAWA HIROYUKI;NISHIKAWA NAOHIRO;KURITA YASUYUKI;HATA MASAHIKO |
分类号 |
H01L29/78;H01L21/336 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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