发明名称 Schottky diode and method of fabricating the same
摘要 A schottky diode may include a schottky junction including a well formed in a semiconductor substrate and a first electrode contacting the first well. The well may have a first conductivity type. A first ohmic junction may include a first junction region formed in the well and a second electrode contacting the first junction region. The first junction region may have a higher concentration of the first conductivity type than the well. A first device isolation region may be formed in the semiconductor substrate separating the schottky junction and the first ohmic junction. A well guard having a second conductivity type opposite to the first conductivity type may be formed in the well. At least a portion of the well guard may be formed under a portion of the schottky junction.
申请公布号 US2010200945(A1) 申请公布日期 2010.08.12
申请号 US20100662452 申请日期 2010.04.19
申请人 KIM DAE-SHIK;KWON OH-KYUM;KIM MYUNG-HEE;KIM YONG-CHAN;PARK HYE-YOUNG;OH JOON-SUK 发明人 KIM DAE-SHIK;KWON OH-KYUM;KIM MYUNG-HEE;KIM YONG-CHAN;PARK HYE-YOUNG;OH JOON-SUK
分类号 H01L29/872 主分类号 H01L29/872
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