发明名称 |
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME, INTEGRATED SEMICONDUCTOR DEVICE USING ITS SEMICONDUCTOR DEVICE AND NONVOLATILE SEMICONDUCTOR STORAGE DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor element having steep switching characteristics at a low voltage in an insulating gate field-effect transistor. SOLUTION: In a MOSFET for a planar type logic circuit used for a large-scale integrated circuit, a diode element and a resistive element are formed in a drain diffusion-layer electrode in a parallel layout. Consequently, a high-performance transistor indicating a steep change in a drain current to a gate-voltage change even at the low voltage can be obtained. COPYRIGHT: (C)2010,JPO&INPIT
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申请公布号 |
JP2009290095(A) |
申请公布日期 |
2009.12.10 |
申请号 |
JP20080142966 |
申请日期 |
2008.05.30 |
申请人 |
HITACHI LTD |
发明人 |
HISAMOTO MASARU;SAITO SHINICHI |
分类号 |
H01L29/78;H01L21/8238;H01L21/8244;H01L21/8247;H01L27/08;H01L27/092;H01L27/10;H01L27/11;H01L27/115;H01L29/786;H01L29/788;H01L29/792 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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