发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME, INTEGRATED SEMICONDUCTOR DEVICE USING ITS SEMICONDUCTOR DEVICE AND NONVOLATILE SEMICONDUCTOR STORAGE DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor element having steep switching characteristics at a low voltage in an insulating gate field-effect transistor. SOLUTION: In a MOSFET for a planar type logic circuit used for a large-scale integrated circuit, a diode element and a resistive element are formed in a drain diffusion-layer electrode in a parallel layout. Consequently, a high-performance transistor indicating a steep change in a drain current to a gate-voltage change even at the low voltage can be obtained. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009290095(A) 申请公布日期 2009.12.10
申请号 JP20080142966 申请日期 2008.05.30
申请人 HITACHI LTD 发明人 HISAMOTO MASARU;SAITO SHINICHI
分类号 H01L29/78;H01L21/8238;H01L21/8244;H01L21/8247;H01L27/08;H01L27/092;H01L27/10;H01L27/11;H01L27/115;H01L29/786;H01L29/788;H01L29/792 主分类号 H01L29/78
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