发明名称 Forming Method of Adjustment Pattern and Liquid Ejection Apparatus
摘要 A forming method of an adjustment pattern is characterized by forming a first adjustment pattern on a medium by ejecting liquid onto the medium from a part of a plurality of nozzles that are arranged along a direction in which the medium is transported and that eject the liquid onto the medium while moving relative to the medium, and subsequently, after transporting the medium, forming a second adjustment pattern on the medium by ejecting the liquid onto the medium from nozzles other than the part of the plurality of nozzles, the second adjustment pattern being lined up in a movement direction of the nozzles with respect to the first adjustment pattern.
申请公布号 US2009262157(A1) 申请公布日期 2009.10.22
申请号 US20070951211 申请日期 2007.12.05
申请人 SEIKO EPSON CORPORATION 发明人 SATO AKITO;SUDO NAOKI
分类号 B41J29/38 主分类号 B41J29/38
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