发明名称 |
CHARGED PARTICLE BEAM ADJUSTMENT METHOD, AND CHARGED PARTICLE BEAM DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a beam condition adjustment method suitable for adjusting a beam condition in a condition different from that of a vertical beam particularly in beam inclination, in a device used for obtaining an image by irradiating a sample with a charged particle beam; and its device. SOLUTION: This device is provided with a control device automatically controlling an astigmatic correction unit, an object lens and a deflector to execute astigmatic correction, focus adjustment and visual field displacement correction, and also provided with a selection means for prohibiting execution of at least one of the astigmatic correction, the focus adjustment and the visual field displacement correction. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2008282826(A) |
申请公布日期 |
2008.11.20 |
申请号 |
JP20080214788 |
申请日期 |
2008.08.25 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
MOROKUMA HIDETOSHI;ARAI NORIAKI;DOI TAKASHI;SASAJIMA JIDAI;KIMURA YOSHIHIRO |
分类号 |
H01J37/147;H01J37/153;H01J37/21;H01J37/22 |
主分类号 |
H01J37/147 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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