发明名称 CHARGED PARTICLE BEAM ADJUSTMENT METHOD, AND CHARGED PARTICLE BEAM DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a beam condition adjustment method suitable for adjusting a beam condition in a condition different from that of a vertical beam particularly in beam inclination, in a device used for obtaining an image by irradiating a sample with a charged particle beam; and its device. SOLUTION: This device is provided with a control device automatically controlling an astigmatic correction unit, an object lens and a deflector to execute astigmatic correction, focus adjustment and visual field displacement correction, and also provided with a selection means for prohibiting execution of at least one of the astigmatic correction, the focus adjustment and the visual field displacement correction. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008282826(A) 申请公布日期 2008.11.20
申请号 JP20080214788 申请日期 2008.08.25
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 MOROKUMA HIDETOSHI;ARAI NORIAKI;DOI TAKASHI;SASAJIMA JIDAI;KIMURA YOSHIHIRO
分类号 H01J37/147;H01J37/153;H01J37/21;H01J37/22 主分类号 H01J37/147
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