发明名称 LIQUID PROCESSING APPARATUS AND METHOD
摘要 A liquid process apparatus is provided to rapidly exhaust process liquid from a drain cup by including a spiral stream forming member for inducing the process liquid in a drain cup to a drain hole. A substrate maintenance part(2) horizontally maintains a substrate, capable of rotating together with the substrate. A rotation cup(4) of an annular type surrounds the substrate maintained by the substrate maintenance part, capable of rotating together with the substrate. A rotation unit(3) rotates the rotation cup and the substrate maintenance part together. A liquid supply unit(5) supplies process liquid to the substrate. A drain cup(51) is made of an annular type corresponding to the rotation cup, receiving the process liquid exhausted from the rotation cup and having a drain hole(60) for draining the received process liquid. When the rotation cup and the substrate maintenance part are rotated, a spiral stream forming member(32a) forms a spiral stream in the drain cup and accompanies the process liquid in the drain cup with the spiral stream to induce the process liquid to the drain hole. The spiral stream forming member can be inserted into the drain cup, and the rotation of the rotation cup and substrate maintenance part is accompanied by rotation of the spiral stream forming member.
申请公布号 KR20070120032(A) 申请公布日期 2007.12.21
申请号 KR20070057770 申请日期 2007.06.13
申请人 TOKYO ELECTRON LIMITED 发明人 NANBA HIROMITSU;ITO NORIHIRO
分类号 H01L21/02;H01L21/304 主分类号 H01L21/02
代理机构 代理人
主权项
地址