| 摘要 |
PROBLEM TO BE SOLVED: To manufacture a crystalline semiconductor film wherein the crystal grains of (100) direction are grown preferentially. SOLUTION: The method of manufacturing the crystalline semiconductor film includes a process for preparing an amorphous semiconductor film, a first crystallizing process for so scanning at least a portion of the amorphous semiconductor film by a laser beam 100 relatively to a first direction as to obtain the semiconductor film having the crystalline region including the crystal grains of (100) direction, and a second crystallizing process for so scanning the crystalline region after the first crystallizing process by a continuously oscillating laser beam 200 relatively to a second different direction from the first direction as to grow preferentially the crystal grains of (100) direction. COPYRIGHT: (C)2007,JPO&INPIT |
