发明名称 Environmental system including a transport region for an immersion lithography apparatus
摘要 An environmental system controls an environment in a gap between an optical assembly and a device and includes a fluid barrier, an immersion fluid system, and a transport region. The fluid barrier is positioned near the device and maintains the transport region near the gap. The immersion fluid system delivers an immersion fluid that fills the gap. The transport region transports at least a portion of the immersion fluid that is near the fluid barrier and the device away from the device. The immersion fluid system can include a fluid removal system that is in fluid communication with the transport region. The transport region can be made of a porous material.
申请公布号 US7251017(B2) 申请公布日期 2007.07.31
申请号 US20050236713 申请日期 2005.09.28
申请人 NIKON CORPORATION 发明人 NOVAK W. THOMAS;HAZELTON ANDREW J.;WATSON DOUGLAS C.
分类号 G03B27/42;G03B27/58;G03F;G03F7/20 主分类号 G03B27/42
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