IMAGE EXPOSURE APPARATUS

摘要

An image exposure apparatus includes: a spatial light modulating element (50), constituted by a plurality of pixel portions for individually modulating light irradiated thereon; a light source (66), for irradiating a light beam B on the spatial light modulating element; and optical system (51), for focusing an image borne by each of the pixel portions; and a micro lens array (55), in which a plurality of micro lenses (55a) into which the light beams modulated by the pixel portions enter individually are provided in an array. The micro lens array 55 is provided in the vicinity of a focusing position of the pixel portions by the focusing optical system (51). Each micro lens (55a) of the micro lens array (55) has different powers in two directions within a plane perpendicular to the optical axis, to correct aberrations caused by anisotropic distortions in the pixel portions.