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发明名称
Verfahren zum Herstellen von Siliziumwafern
摘要
申请公布号
DE19609107(B4)
申请公布日期
2006.07.27
申请号
DE19961009107
申请日期
1996.03.08
申请人
TOSHIBA CERAMICS CO., LTD.
发明人
HAYASHI, KENRO;TAKEDA, RYUJI;CHAKI, KATSUHIRO;XIN, PING;YOSHIKAWA, JUN;SAITO, HIROYUKI
分类号
C30B33/02;C30B15/00;C30B33/00;H01L21/322
主分类号
C30B33/02
代理机构
代理人
主权项
地址
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