| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus wherein the purging time of a pellicle space of the space surrounded by a reticle carried in the exposure apparatus and a pellicle can be so shortened as to be able to shorten the carrying-in time of the reticle and as to improve the productivity of semiconductor devices. <P>SOLUTION: Feeding and exhausting nozzles 33, 34 for feeding and exhausting respectively an inert gas are so provided approximately or adhesively to one or more feeding ports a and to one or more exhausting ports b which are provided respectively in a pellicle frame 25 as to purge a pellicle space 20 via these feeding and exhausting ports, and as to apply a pressure nearly equal to the pressure of the pellicle space from the outside of a pellicle film. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
