| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a set for adjusting a water-based dispersing element for chemical-mechanical polishing which can suppress surface defects such as dishing, erosion, and scratches in a process of flattening a polished surface by chemical-mechanical polishing, and which excels in long-time stability even in a concentrated state. <P>SOLUTION: The set for adjusting the water-based dispersing element for chemical-mechanical polishing is composed of a water-based dispersing element (A) which is blended with a dispersing agent in accordance with an abrasive grain and a need, and an aqueous solution (B) which is blended with an organic acid in accordance with the abrasive grain and the need. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
