FACILITY AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICES AND STOKER FOR BEING USED IN THIS

摘要

Equipment for fabricating a semiconductor device is provided to prevent a native oxide layer from being formed on a wafer in a FOUP(front open unified pod) by transferring and storing the FOUP while the FOUP is filled with inactive gas. A plurality of semiconductor substrates are received in equipment for fabricating a semiconductor device by using a container having a hole in its one surface. A predetermined process is performed on the semiconductor substrate in a process chamber. A gas injecting part injects gas to the inside of the container having the plurality of semiconductor substrate having undergone the process. A sealing member stops up the hole formed in the container to seal the container into which the gas is injected.