| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligner capable of optionally setting the size of a pattern to be formed on a photosensitive substrate at the time of splice exposure. SOLUTION: The aligner for illuminating a mask by exposure light while synchronously moving the mask and the photosensitive substrate in the X axis direction and exposing the mask so that a part of a pattern image of the mask which is to be transferred to the substrate next is overlapped to a pattern image, of a mask which is previously transferred to the substrate comprises a visual field stop 20 for setting the width of a pattern image in the X axis direction which is to be transferred to the photosensitive substrate, a light shielding plate 40 for setting the width of the pattern image in the Y axis direction, and a blind 30 having two attenuation parts 30A, 30B for setting an overlapped area of pattern images and gradually attenuating the integrated exposure quantity of the overlapped area of the pattern images to a direction oriented to the peripheries of the pattern images. COPYRIGHT: (C)2005,JPO&NCIPI
|
