| 摘要 |
PROBLEM TO BE SOLVED: To provide a process for producing an electromagnetic wave shield capable of obtaining a sufficient percentage of open area without sacrifice of visibility. SOLUTION: The process for producing an electromagnetic wave shield comprises a step for forming a UV-curing black layer 34 and a conductive layer 35 sequentially, in layer, on the surface of a transparent glass 30A, a step for pattern exposing and developing them and further exposing the black layer 34 from the rear side of the transparent glass 30A to form an intermediate body, and a step for heat treating the intermediate body to form a conductive pattern of an electromagnetic wave shield layer. Conductive ink for forming the conductive layer 35 contains acid polymer, monomer, oligomer, an optical reaction initiator, and a conductivity imparting filler. A mask pattern 36 is applied tightly to the surface of the conductive layer 35 when the black layer 34 and the conductive layer 35 are exposed. COPYRIGHT: (C)2005,JPO&NCIPI
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