| 摘要 |
PROBLEM TO BE SOLVED: To provide a washing liquid having a high washing effect even when a board having an easily corrosive metal film such as a copper film is washed and preventing deterioration and corrosion of the metal film, with respect to the washing liquid used for removing a resist residue and the like generated when a resist is subjected to ashing treatment and the like in the manufacture of an electronic circuit pattern. SOLUTION: The washing liquid is used, containing a dissolving agent consisting of an amine compound such as methyl amine or a fluoride such as ammonium fluoride or an alkyl ammonium fluoride, water and a corrosion preventing agent consisting of specific compounds of hydantoins such as hydantoin or allantoin. COPYRIGHT: (C)2004,JPO&NCIPI |
