发明名称 Manufacture of exposed structures using exposure apparatus, by reading macro line data sets for lines being exposed from memory while further macro lines are written to memory
摘要 The method involves exposing a substrate body (28) in the region of a module within a number of macro-lines to form each of a number of identical structures. An exposure apparatus includes a number of light sources which are driven simultaneously by a controller with a memory from which data sets of macro lines being exposed are read while data sets of further macro lines are stored. An Independent claim is included for an apparatus for manufacturing exposed structures.
申请公布号 DE10242142(A1) 申请公布日期 2004.03.25
申请号 DE20021042142 申请日期 2002.09.03
申请人 KLEO HALBLEITERTECHNIK GMBH & CO KG 发明人 OPOWER, HANS;SCHARL, STEFAN;LEINENBACH, DIRK
分类号 G03F7/20;(IPC1-7):G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项
地址