| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of cleaning a gasifier and semiconductor manufacturing equipment which has a structure that a material made by dissolving a solid CVD material in an organic solvent is supplied in a gasified state from a gasifying and supplying apparatus to the semiconductor manufacturing equipment, and after finishing the manufacturing of a semiconductor, a residual solid CVD material remaining in the gasifier, a heated product from the solid CVD material, and a residual solid CVD material remaining in the semiconductor manufacturing equipment and a residue remaining after the reaction of the solid CVD material are removed easily in a short time without removing the gasifier, the semiconductor manufacturing equipment or the like from the gasifying and supplying apparatus. SOLUTION: The inside of the gasifier and of the semiconductor manufacturing equipment is washed with the steam of the organic solvent used to dissolve the solid CVD material, and then a residual remaining after the washing is removed by at least one means selected from among the introduction of dried gas, decompression, and heating. COPYRIGHT: (C)2004,JPO
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