| 摘要 |
PROBLEM TO BE SOLVED: To provide a film-forming method for flattening a film by suppressing lifting of ends of the film in drying, and to provide a film-forming apparatus. SOLUTION: The film-forming apparatus discharges a liquid material from a liquid discharge head 21 as droplets and forms the film of the liquid material on a substrate 20, which is a substance to be treated forming a pattern. A control means lessens the amount of arrangement of the liquid material arranged on the substrate 20 in a region 51 outside of a pattern region 50 as compared with the pattern area 50, in which the pattern is formed. COPYRIGHT: (C)2003,JPO
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