| 摘要 |
PROBLEM TO BE SOLVED: To provide a wafer inspection device in which a conventional wafer inspection device cannot inspect and measure electric characteristics of a wafer but the wafer can be inspected relatively easily. SOLUTION: The wafer inspection device comprises a wafer stage for placing the waver to be inspected, a camera provided oppositely to the stage, and a rotor provided between the stage and the camera. The rotor has a positioning region which can recognize the position of the wafer by the camera, a first region having first emissivity, and a second region having second emissivity different from the first emissivity. COPYRIGHT: (C)2003,JPO
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