| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing pad having increased polishing rate by improving the affinity of the slurry to the polishing pad. SOLUTION: The polishing pad is made of a polyurethane composition. The polyurethane composition contains a urethane resin copolymerized with a compound having a hydrophilic group and the composition contains a hydrophilicizing agent. The hydrophilicizing agent is one or more compounds selected from 2,4,7,9-tetramethyl-5-decyne-4,7-diol-dipolyoxyethylene ether, 2,4,7,9- tetramethyl-5-decyne-4,7-diol and polymethylalkylsiloxane and the compound having a hydrophilicizing group is one or more compounds selected from ethylene oxide monomer, propylene oxide monomer and ethylene propylene oxide monomer. |
