| 摘要 |
PROBLEM TO BE SOLVED: To provide a radiation sensitive composition excellent in storage stability as well as in resolution and environmental resistance as a chemical amplification type resist sensitive to active radiations, e.g. UV rays such as g- or i-line, KrF, ArF or F2 excimer laser light, far UV typified by EUV (extreme-ultraviolet radiation) or an electron beam. SOLUTION: The radiation sensitive resin composition contains a nitrogen- containing compound having a specified structure. |
