发明名称 |
Use of alkoxy N-hydroxyalkyl alkanamide as resist removing agent, composition for removing resist, method for preparing the same and resist removing method using the same |
摘要 |
A resist removing agent and a resist removing composition, having an excellent capability for removing a resist and polymer and which does not attack underlying layers, a method for preparing the same and a resist removing method using the same. The resist removing agent includes alkoxy N-hydroxyalkyl alkanamide. The resist removing composition includes alkoxy N-hydroxyalkyl alkanamide, and at least one compound selected from a group consisting of a polar material having a dipole moment of 3 or greater, an attack inhibitor and alkanolamine. A substrate having the resist thereon is brought into contact with the resist removing agent or resist removing composition to remove the resist.
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申请公布号 |
US6398874(B2) |
申请公布日期 |
2002.06.04 |
申请号 |
US20010884992 |
申请日期 |
2001.06.21 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PARK DONG-JIN;HWANG JIN-HO;GIL JUNE-ING;PARK JE-EUNG;CHON SANG-MUN |
分类号 |
G03F7/42;(IPC1-7):B08B3/04;C11D3/30;C11D9/30 |
主分类号 |
G03F7/42 |
代理机构 |
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主权项 |
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