发明名称 Polymer pattern forming method
摘要 A polymer pattern forming method including the steps of (a) generating radicals in a pattern forming region of a matrix layer which uniformly contains a radical generating agent, thereby forming a patterned latent image due to the radicals in the pattern forming region; and (b) bringing a monomer which polymerizes by radical polymerization into contact with the matrix layer in which the patterned latent image has been or is being formed, to have the radicals which have been or are being generated induce a chain addition polymerization of the monomer so as to form a polymer pattern on the pattern forming region.
申请公布号 US6372411(B1) 申请公布日期 2002.04.16
申请号 US19990261463 申请日期 1999.02.24
申请人 OKI ELECTRIC INDUSTRY CO., LTD. 发明人 KOYANO TAKESHI;MAENO YOSHINORI;MITA JURO;KAIFU KATSUAKI
分类号 G02B6/13;C08F2/00;C08J3/28;G03F7/027;G03F7/38;(IPC1-7):G03F7/00 主分类号 G02B6/13
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