发明名称 |
Polymer pattern forming method |
摘要 |
A polymer pattern forming method including the steps of (a) generating radicals in a pattern forming region of a matrix layer which uniformly contains a radical generating agent, thereby forming a patterned latent image due to the radicals in the pattern forming region; and (b) bringing a monomer which polymerizes by radical polymerization into contact with the matrix layer in which the patterned latent image has been or is being formed, to have the radicals which have been or are being generated induce a chain addition polymerization of the monomer so as to form a polymer pattern on the pattern forming region.
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申请公布号 |
US6372411(B1) |
申请公布日期 |
2002.04.16 |
申请号 |
US19990261463 |
申请日期 |
1999.02.24 |
申请人 |
OKI ELECTRIC INDUSTRY CO., LTD. |
发明人 |
KOYANO TAKESHI;MAENO YOSHINORI;MITA JURO;KAIFU KATSUAKI |
分类号 |
G02B6/13;C08F2/00;C08J3/28;G03F7/027;G03F7/38;(IPC1-7):G03F7/00 |
主分类号 |
G02B6/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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