发明名称 |
Slurry recycling system and method for CMP apparatus |
摘要 |
A slurry recycling system for a CMP apparatus includes a flow path through which a slurry used in the CMP apparatus flows. A first filter is disposed in the flow path for filtering out foreign matter of a particle size of more than 0.5 microns mixed in said slurry. A second filter is preferably disposed in the flow path at a location upstream of and away from the first filter for filtering out foreign matter of a particle size of more than 10 microns mixed in said slurry. Preferably, provisions are made for a concentration adjuster for adjusting the concentration of abrasives in said slurry to substantially an initial value before use, and a pH adjuster for adjusting the pH of said slurry to substantially an initial pH value before use.
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申请公布号 |
US6106728(A) |
申请公布日期 |
2000.08.22 |
申请号 |
US19980103653 |
申请日期 |
1998.06.23 |
申请人 |
IIDA, SHINYA;YOSHIDA, AKITOSHI |
发明人 |
IIDA, SHINYA;YOSHIDA, AKITOSHI |
分类号 |
B24B37/00;B24B37/04;B24B57/02;(IPC1-7):B24B1/00;H01L21/00 |
主分类号 |
B24B37/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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