| 摘要 |
PROBLEM TO BE SOLVED: To make a position measuring mechanism mounted on a stage small in size and light in weight even when the moving range of the stage is large. SOLUTION: This aligner is provided with a projection optical system for projecting exposing light radiated to a reticle where a pattern is formed on a wafer 2, the stage holding the wafer 2 or the reticle and positioning, an alignment optical system radiating alignment light, a reflection mirror 7 arranged on the stage, and an interferometer for measuring the position of the stage by radiating light to the mirror 7. The aligner is also provided with plural interferometers measuring the position of the stage in a specified direction, and the separate interferometers are used as the interferometers used to measure the position of the stage in the specified direction in the case of positioning the stage with respect to the projection optical system and in the case of positioning the stage with respect to the alignment optical system. Thus, the length of the mirror 7 is shortened and the stage is made small in size and light in weight. |
