| 摘要 |
PROBLEM TO BE SOLVED: To obtain an IR and UV sensitive compsn. which produces a good result in alkali development independently of a system (UV or IR) used for imprinting an image by using a diazo resin, a diazo ester, a novolak resin and an IR absorber. SOLUTION: The IR and UV sensitive compsn. consists of a diazo resin, a diazo ester, a novolak resin and an IR absorber and has sensitivity to both IR and UV. The diazo resin is preferably an esterification product of a polycondensation product of naphthoquinonediazidosulfonyl chloride, phenol and its homologue. The diazo ester is preferably a partial or complete esterification product of tetrahydroxybenzophenone and naphthoquinonediazidosulfonyl chloride. Two novolak resins are preferably contained in the compsn., the 1st novolak resin has a wt. average mol.wt. of 2,000-6,000 and the 2nd novolak resin has a wt. average mol.wt. of 7,000-14,000. |
