发明名称 |
METHOD FOR FABRICATING PHOTO MASK |
摘要 |
PURPOSE: A method for fabricating a photo mask for use in a exposure process using a sensitizer is provided. CONSTITUTION: The method for fabricating a photo mask includes the step of forming the mask by use of the sensitizer used in a exposure process of semiconductor, instead of conventional chromium. The method enables more accurate mask to be produced and improves the production costs and yield.
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申请公布号 |
KR20000004550(A) |
申请公布日期 |
2000.01.25 |
申请号 |
KR19980025994 |
申请日期 |
1998.06.30 |
申请人 |
HYUNDAI ELECTRONICS IND. CO., LTD |
发明人 |
KIM, HYEONG SU |
分类号 |
H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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