发明名称 MASK STAGE BASE
摘要 PURPOSE:To prevent damage due to drop and to reduce a size by forming an attractive maintenance mechanism for holding the mask structure in a vacuum attraction state and providing th attractive face with positioning pins. CONSTITUTION:The attractive maintenance mechanism 18 for holding the mask structure 24 in a vacuum attraction state and providing the attractive face with the positioning pins 14, 15. Since the X ray mask structure 20 is held in a pending state and vacuum attraction is executed, even if vacuum pipings 19 or a vacuum pump are out of order and attractive force is lost, the structure 20 does not drop.
申请公布号 JPH04159554(A) 申请公布日期 1992.06.02
申请号 JP19900284299 申请日期 1990.10.24
申请人 CANON INC 发明人 FUJIOKA HIDEHIKO
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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