LITHOGRAPHIC MASK AND FORMATION METHOD OF PATTERN

摘要

PURPOSE: To provide a mask capable of preventing the occurrence of a bright spot in an image on a substrate. CONSTITUTION: Plural phase shifting areas 24, 26, 28 are arranged by a matrix of parallel rows and columns having edges separated at an interval less than a distance separating the images of the edges, having different optionally selectable angular directions (non-parallel and parallel) on a substance not shifting a phase and capable of easily writing a phase shifting area on an image surface by an optional pattern. At least one of the phase shifting areas 24, 26, 28 constitutes a connecting phase shifting area 28 having an edge separated from the edge of its adjacent phase shifting area within a minimum distance to form a pattern by a continuous body of photoresist covering an area corresponding to the phase shifting area by the exposure of the mask 10b.