| 摘要 |
Compounds of the formula (I) <IMAGE> in which R1 is hydrogen, methyl or halogen, n is 2 or 3 and R is C1-C6-alkyl, benzyl, 2-tetrahydrofuryl, 2-tetrahydropyranyl, C1-C6-alkoxycarbonyl, phenoxycarbonyl or benzyloxycarbonyl, or, if two of the substituents OR are in the ortho position with respect to one another, two radicals R together form an ethylene group which is optionally substituted by up to four C1-C6-alkyl groups or form a C2-C6-alkylidene group, can be polymerised, optionally in the presence of other unsaturated comonomers, to form polymers having a molecular weight Mw of 10<3> to 10<6>. These polymers are suitable for producing positive-working photoresists having high resolution and very good contrast. |
