| 摘要 |
An active matrix reflective projection system utilizing a conventional wafer includes a reflective image plane module. The reflective image plane module includes light directing and reflecting structures and a wafer based active matrix mated thereto. A source of light is directed to the reflective image plane module wherein the wafer based active matrix imparts information onto a light beam reflected therefrom. The reflective image plane module projects the reflected beam for viewing, such as through one or more lens. The active matrix reflective projection system can be a monochrome projector including a single reflective image plane module or can be a full color system including three reflective image plane modules. Each color reflective image plane module operates on a single color component, red, green or blue, which then are combined on a screen or before projecting on the screen to form the full color projection image. The wafer based active matrix includes a specular reflective back surface and an LC or similar type material formed thereon which is electronically altered to impart the information to the light beam reflected therefrom. The LC material preferably is a solid light modulating material having bodies of LC material suspended in the solid material. The reflective image plane module includes a prism or mirror which passes the light or light component through a first surface to the wafer based active matrix mated to a second surface and which projects the reflected light from the first surface to be viewed.
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