摘要 |
PURPOSE:To extinguish the diffraction pattern due to an opening of an aperture by moving the aperture, which is provided on a device and has the opening, in the direction of the optical path. CONSTITUTION:The device consists of an aperture 42 having an opening 44 which limits a luminous flux, a holding means 64 which holds the aperture 42 so that the opening 44 is moved along the optical axis, and a driving means 60 which is related to the holding means with respect to operation and transmits the moving force. The diffraction pattern eraser is arranged in the optical path so that the luminous flux passes the opening 44 of the aperture 42, and the aperture 42 is moved back and forth in the direction of the optical path. Thereafter, a luminous flux of good coherence is made incident on the opening 44 of the aperture 42. Then, the diffraction pattern on photosensitive materials generated by the opening 44 of the aperture 42 is expanded or reduced by back- and-forth movement of the aperture 42 in the direction of the optical path to change the diameter of the diffraction pattern, thus averaging the exposure due to the diffraction pattern to extinguish it.
|