发明名称 STAGE DEVICE
摘要 PURPOSE:To prevent a wafer from shifting in position laterally even at the time of leveling after the stepping of a wafer stage responding to one shot by providing a specific leveling stage to a Z stage equipped with a plane mirror for an interferometer. CONSTITUTION:The Z stage 4 equipped with the plane mirror 8 for the interferometer 10 in two orthogonal directions on an XY stage 6 is provided with the leveling stage 2 where the wafer W is mounted. This stage 2 is provided with arm parts 2a formed of a radial bearing 26, a doughnut-shaped leaf spring 20a, etc., at intervals of 120 deg. and the wafer W is leveled through a motor-driven slanting nut 28. The spring 20a has its operation center point OA concentrically with a circular stage 2 and is coincident with a reference plane R in a neutral state, and the quantity of lateral shifting at the time of the bearing of the wafer W is an extremely small value represented by the cosine function of a tilt angle theta and ignored substantially. Consequently, the wafer never shifts in position laterally even at the bearing after the stepping of the wafer stage to one shot.
申请公布号 JPS62274201(A) 申请公布日期 1987.11.28
申请号 JP19860118832 申请日期 1986.05.23
申请人 NIKON CORP 发明人 TANAKA HIROSHI;KAKIZAKI YUKIO
分类号 H01L21/30;G01B5/00;G01B11/00;G03F7/20;G05D3/00;G12B5/00;H01L21/027;H01L21/67;H01L21/68 主分类号 H01L21/30
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