| 摘要 |
Monocrystalline metal layers having a low specific electrical resistance ( rho <15 mu OMEGA cm) are produced by depositing a layer of a select metal or alloy in its polycrystalline state onto a substrate useful in semiconductor and thin film technologies, such as composed of glass, ceramic or silicon; substantially simultaneously with the deposition or thereafter, implanting ions which are inert relative to the metal or alloy so as to generate crystal lattice disruptions in the deposited layer and thereafter heating the so-coated substrate so as to convert the polycrystalline layer into its monocrystalline state. The principles of the invention are particularly applicable for the production of lead structures in micro-electronics. |
