发明名称 Apparatus for contouring edge of semiconductor wafers
摘要 Apparatus is provided for beveling or rounding the edge of thin, disc-like workpieces, such as silicon wafers integrated circuit masks and the like and includes a rotatable holder for receiving and releasably holding such a workpiece and rotating the workpiece with its edge free of obstruction. A rotating grinding wheel axially parallel to the workpiece and holder and having a V-shaped circumferential groove is urged against the edge of the workpiece by resilient biasing means so that the grinding wheel will be maintained in grinding engagement with the workpiece edge during the rotation of the workpiece.
申请公布号 US4031667(A) 申请公布日期 1977.06.28
申请号 US19760671392 申请日期 1976.03.29
申请人 MACRONETICS, INC. 发明人 SEHESTEDT, WILLIAM H.
分类号 B24B9/06;H01L21/304;(IPC1-7):B24B9/00 主分类号 B24B9/06
代理机构 代理人
主权项
地址