发明名称 |
CHARGE STORAGE NODES WITH CONDUCTIVE NANODOTS |
摘要 |
Methods of forming memory cells having conductive nanodots over a charge storage material are useful in non-volatile memory devices and electronic systems. |
申请公布号 |
US2014302648(A1) |
申请公布日期 |
2014.10.09 |
申请号 |
US201414309186 |
申请日期 |
2014.06.19 |
申请人 |
Micron Technology, Inc. |
发明人 |
Ramaswamy Nirmal |
分类号 |
H01L21/28;H01L27/115 |
主分类号 |
H01L21/28 |
代理机构 |
|
代理人 |
|
主权项 |
1. A method of forming a memory cell, the method comprising:
forming a first dielectric over a semiconductor; forming a charge storage material over the first dielectric; forming conductive nanodots over the charge storage material; forming a second dielectric over the conductive nanodots; forming a control gate over the second dielectric; and forming source/drain regions in the semiconductor generally adjacent the first dielectric. |
地址 |
Boise ID US |