发明名称 CHARGE STORAGE NODES WITH CONDUCTIVE NANODOTS
摘要 Methods of forming memory cells having conductive nanodots over a charge storage material are useful in non-volatile memory devices and electronic systems.
申请公布号 US2014302648(A1) 申请公布日期 2014.10.09
申请号 US201414309186 申请日期 2014.06.19
申请人 Micron Technology, Inc. 发明人 Ramaswamy Nirmal
分类号 H01L21/28;H01L27/115 主分类号 H01L21/28
代理机构 代理人
主权项 1. A method of forming a memory cell, the method comprising: forming a first dielectric over a semiconductor; forming a charge storage material over the first dielectric; forming conductive nanodots over the charge storage material; forming a second dielectric over the conductive nanodots; forming a control gate over the second dielectric; and forming source/drain regions in the semiconductor generally adjacent the first dielectric.
地址 Boise ID US