首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
PROCEDE AMELIORE POUR LA PREPARATION D'EMULSIONS DE TERPOLYMERES DE CHLORURE DE VINYLE, D'ACETATE DE VINYLE ET D'ETHYLENE
摘要
申请公布号
BE855810(A1)
申请公布日期
1977.12.19
申请号
BE19770178535
申请日期
1977.06.17
申请人
SUMITOMO CHEMICAL CY LTD
发明人
分类号
C08F214/00;C08F2/00;C08F2/22;C08F6/00;C08F6/06;C08F14/00;C08F210/00;C08F214/06;C08F218/00;C08F218/02;C08F218/08;C08F291/00;(IPC1-7):C08F/
主分类号
C08F214/00
代理机构
代理人
主权项
地址
您可能感兴趣的专利
Field effect transistors including asymmetrical silicide structures and related devices
Semiconductor device and semiconductor memory devices having first, second, and third insulating layers
Method for fabricating a power semiconductor package including vertically stacked driver IC
Multi-chip package having a logic chip disposed in a package substrate opening and connecting to an interposer
Microelectronic device packages, stacked microelectronic device packages, and methods for manufacturing microelectronic devices
Abutment structure of semiconductor cell
Method for manufacturing a semiconductor chip with each contact pad having a pad cell associated therewith
Device and method of manufacturing the same
Integrated circuit packaging system with patterned substrate and method of manufacture thereof
Front-to-back bonding with through-substrate via (TSV)
Diffusion barrier for surface mount modules
Method of wafer dicing using hybrid laser scribing and plasma etch approach with mask plasma treatment for improved mask etch resistance
Methods for forming passivation protection for an interconnection structure
SOI RF device and method for forming the same
Susceptor heater and method of heating a substrate
High aspect ratio plasma etch for 3D NAND semiconductor applications
Manufacturing method of MIS-type semiconductor device, including heating a zirconium oxynitride (ZrON) layer
Plasma pre-clean module and process
Atmospheric pressure ion source for mass spectrometry
Method for mass spectrometry