发明名称
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which excels in accuracy of thickness and uniformity of height and allows the manufacturing process thereof to be shortened because it has adhesive property after being photocured, and which comprises: a cyclic olefin resin (A) having a photoreactive functional group; an acid generator (B); and a compound (C) capable of curing reaction by the action of an acid generator. <P>SOLUTION: The photosensitive resin composition comprises: the cyclic olefin resin (A) having a photoreactive functional group; the acid generator (B); and the compound (C) capable of curing reaction by the action of an acid generator. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP5040432(B2) 申请公布日期 2012.10.03
申请号 JP20070129640 申请日期 2007.05.15
申请人 发明人
分类号 G03F7/038 主分类号 G03F7/038
代理机构 代理人
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