SILICON EPITAXIAL WAFER AND METHOD FOR MANUFACTURING THE SAME,申请号KR20107020637-传众专利搜索

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发明名称	SILICON EPITAXIAL WAFER AND METHOD FOR MANUFACTURING THE SAME
摘要
申请公布号	KR20100123722(A)	申请公布日期	2010.11.24
申请号	KR20107020637	申请日期	2009.02.27
申请人	SHIN-ETSU HANDOTAI CO., LTD.	发明人	ARAI TAKESHI
分类号	H01L21/20;H01L21/683	主分类号	H01L21/20
代理机构		代理人
主权项
地址

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