| 摘要 |
PROBLEM TO BE SOLVED: To provide a heating apparatus wherein when heating such a heated object as silicon carbide wafer by performing the inductive heat generation of a process tube made of glassy carbon and for storing the heated object, without any smearing of the heated object, the heated object can be heated up to a high temperature of about 2,000°C or exceeding 2,000°C by a few hundreds degrees C. SOLUTION: The heating apparatus has a process tube 1 made of glassy carbon to store a heated object and a cooling mantle body 2 made of quartz to store the process tube 1 made of glassy carbon for cooling. It has also a heat insulating body 3 interposed between the process tube 1 made of glassy carbon and the cooling mantle body 2 made of quartz to surround the process tube 1 made of glassy carbon, and a high-frequency inductive coil 4 disposed on the outside of the cooling mantle body 2 made of quartz to generate the inductive heat of the process tube 1 made of glassy carbon. COPYRIGHT: (C)2008,JPO&INPIT
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