发明名称 MEASUREMENT METHOD AND APPARATUS, EXPOSURE APPARATUS AND METHOD, ADJUSTING METHOD AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a method and apparatus for measurement by which a position of an aperture stop in an optical system is measured at high accuracy. <P>SOLUTION: A measurement method for measuring the position of the aperture stop in the optical system includes the steps of measuring a light intensity distribution of light that passes the aperture stop, at a position that is optically conjugate with a pupil position in the optical system, and determining a position of the aperture stop in the optical system based on a diffraction fringe of the light intensity distribution measured by the measuring step. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007294934(A) 申请公布日期 2007.11.08
申请号 JP20070086006 申请日期 2007.03.28
申请人 CANON INC 发明人 SHIODE YOSHIHIRO
分类号 H01L21/027;G01B11/00;G03F7/20 主分类号 H01L21/027
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