| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition which is a resist excellent in sensitivity and resolution, ensuring small line edge roughness of a pattern, and capable of well maintaining the pattern shape. <P>SOLUTION: The radiation sensitive resin composition contains (A) an acid dissociable group-containing copolymer containing an alkyl substituted norbornane lactone ring, (B) a sulfonic ester type acid increaser and (C) an acid generator. <P>COPYRIGHT: (C)2007,JPO&INPIT |
