| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a measuring technique for the film thickness of the antireflective layer of an antireflective film capable of measuring continuously the film thickness of the antireflectve layer over the full width of a film during driving condition of a film under manufacturing of an antireflective film. <P>SOLUTION: The measuring technique for the film thickness of the antireflective layer of an antireflective film, in which the emulsion side of the antireflective layer of the antireflective film and reflected light is irradiated long-wave ultraviolet light of wavelength of 365 to 400 nm from both the emulsion side and the rear side is forced to interfere mutually, is characterized by measuring the film thickness using gray-scale optical images (optical signals) acquired from the interference. <P>COPYRIGHT: (C)2007,JPO&INPIT |
